Nano-Micro Letters

Fast Growth of Highly Ordered TiO2 Nanotube Arrays on Si Substrate under High-Field Anodization

Jingnan Song1, Maojun Zheng1,2,*, Bin Zhang1, Qiang Li1, Faze Wang1, Liguo Ma1, Yanbo Li3, Changqing Zhu1, Li Ma4, Wenzhong Shen1

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Nano-Micro Lett. (2017) 9: 13

First Online: 09 November 2016 (Article)

DOI: 10.1007/s40820-016-0114-4




SEM images of top view a and cross-section b of Ti film deposited by the direct-current magnetron sputtering.

Highly ordered TiO2 nanotube arrays (NTAs) on Si substrate possess broad applications due to its high surface-to-volume ratio and novel functionalities, however, there are still some challenges on facile synthesis. Here, we report a simple and cost-effective high-field (90-180 V) anodization method to grow highly ordered TiO2 NTAs on Si substrate, and investigate the effect of anodization time, voltage and fluoride content on the formation of TiO2 NTAs. The current density-time curves, recorded during anodization processes, can be used to determine the optimum anodization time. It is found that the growth rate of TiO2 NTAs is improved significantly under high field, which is nearly 8 times faster than that under low fields (40-60 V). The length and growth rate of the nanotubes are further increased with the increase of fluoride content in the electrolyte.



TiO2 nanotube arrays; Si substrate; Anodization; High field; Controllable preparation


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